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The sources in both ICP and DCP are different. An ICP (inductively coupled plasma) can be generated by directing the energy of a radio frequency generator into a suitable gas, usually ICP argon. Other plasma gases used are Helium and Nitrogen. A direct-current plasma (DCP) is created by an electrical discharge between two electrodes. A plasma support gas, commonly ICP argon, is necessary.
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ProfessorICP (Inductively Coupled Plasma) is a technique used for elemental analysis in which a sample is atomized and ionized by a plasma torch, and then the ions are detected based on their mass-to-charge ratio. DCP (Direct Current Plasma) is another elemental analysis technique that uses a direct current discharge to atomize and ionize the sample.
ICP typically offers higher sensitivity and lower detection limits compared to DCP. The operating conditions and instrument design also differ between the two techniques.
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What is the difference between ICP-AES and ICP-OES analysis?
ICP-AES (Inductively Coupled Plasma-Atomic Emission Spectroscopy) measures the intensity of emitted light from excited atoms to determine elemental composition, while ICP-OES (Inductively Coupled Plasma-Optical Emission Spectroscopy) measures the intensity of emitted light and analyses the wavelengths to determine elemental composition. ICP-OES typically provides higher sensitivity and lower detection limits compared to ICP-AES.
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How do you measure the temperature of ICP?
The temperature of an inductively coupled plasma (ICP) can be measured using a thermocouple that is inserted into the plasma torch or near the plasma. The thermocouple converts the temperature into an electrical signal that can be read by a temperature display unit or data system. Additionally, infrared thermometers or thermal imaging cameras can also be used to measure the temperature of the ICP non-invasively.
