What is difference between ICP and DCP?

Answer 1

The sources in both ICP and DCP are different. An ICP (inductively coupled plasma) can be generated by directing the energy of a radio frequency generator into a suitable gas, usually ICP argon. Other plasma gases used are Helium and Nitrogen. A direct-current plasma (DCP) is created by an electrical discharge between two electrodes. A plasma support gas, commonly ICP argon, is necessary.

Answer 2

ICP (Inductively Coupled Plasma) is a technique used for elemental analysis in which a sample is atomized and ionized by a plasma torch, and then the ions are detected based on their mass-to-charge ratio. DCP (Direct Current Plasma) is another elemental analysis technique that uses a direct current discharge to atomize and ionize the sample.

ICP typically offers higher sensitivity and lower detection limits compared to DCP. The operating conditions and instrument design also differ between the two techniques.